What is TFT LCD Module Display?

The full name of TFT is Thin Film Transistor (thin film field effect transistor), which means that each liquid crystal pixel on the liquid crystal display is driven by a thin film transistor integrated behind it, so that a high-speed, high-brightness, high-contrast display screen can be achieved. Information, TFT is an active matrix liquid crystal display, and TFT-LCD (Thin Film Transistor Liquid Crystal Display) is a type of most liquid crystal displays.

What are the main features of TFT Displays?

Large area
In the early 1990s, the first generation of large-area glass substrate (300mm×400mm) TFT-LCD production line was put into production. By the first half of 2000, the area of the glass substrate had been expanded to 680mm×880mm), and the glass substrate of 950mm×1200mm will also be put into operation recently. . In principle, there is no area limitation.

High integration
The resolution of the 1.3-inch TFT chip used for LCD projection is XGA and contains one million pixels. The film thickness of the 16.1-inch TFT array amorphous silicon with a resolution of SXGA (1280×1024) is only 50nm, and TAB ON GLASS and SYSTEM ON GLASS technologies, the integration level of IC, the requirements for equipment and supply technology, and the technical difficulty Both exceed the traditional LSI.

TFT was first used as a matrix addressing circuit to improve the light valve characteristics of liquid crystals. For high-resolution displays, precise control of object elements is achieved through voltage regulation in the range of 0-6V (its typical value is 0.2 to 4V), making it possible for LCDs to achieve high-quality high-resolution displays. TFT-LCD is the first flat panel display in human history that surpasses CRT in display quality. Now people are beginning to integrate the driver IC on the glass substrate, and the function of the whole TFT will be more powerful, which is unmatched by traditional large-scale semiconductor integrated circuits.

Low cost
Glass substrates and plastic substrates fundamentally solve the cost problem of large-scale semiconductor integrated circuits, and open up a broad application space for the application of large-scale semiconductor integrated circuits.

The process is flexible
In addition to sputtering, CVD (Chemical Vapor Deposition) and MCVD (Molecular Chemical Vapor Deposition) to form films, laser annealing technology has also begun to be applied, which can produce amorphous films, polycrystalline films, and single crystal films. Not only silicon films can be produced, but also other II-VI and III-V semiconductor thin films can be produced.

Wide range of applications
The liquid crystal flat panel display based on TFT technology is the pillar industry of the information society, and the technology can be applied to the rapidly growing thin film transistor organic electroluminescence (TFT-OLED) flat panel display is also growing rapidly.